Low Stress, High Modulus, Photosensitive Polyimide
نویسندگان
چکیده
منابع مشابه
Application of Photosensitive Polyimide: Mask Saving Process for Buffer Coating
Issues in the LSI polyimide buffer coating process which uses photosensitive polyimide also as a mask of passivation film etching are reviewed. Change of lithography wave length from g-line to i-line causes the difficulty in the polyimide patterning. However, today's improved polymers, both ester type and ionic type, have enough ability to open 10 um windows. Dry etching condition must be adjus...
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An aromatic photosensitive polyimide is prepared from 3,3',4,4'-benzophenone tetracarboxylic dianhydride and 4,4'-diaminodiphenyl methane and its structuring ability upon UV-laser exposure is investigated. Surface modification is performed at two laser fluences, i.e. 89 and 244 mJ/cm2, and different number of pulses. The changes of the surface morphology, induced by the employed patterning tech...
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 2015
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.28.215